FACILITYEquipment
Equipment Devices & Displays Research Lab.
Process Facilities and Equipment
Photochemical process
| Name | Mask aligner UV exposure |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 4" |
| Spec2 | Contact, Non-contact, Vacuum mode |
| Spec3 |
| Name | DUV Chamber (Xe) |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | 250 ~ 700 nm (100%) |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | DUV Chamber (Excimer) |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | 172 m, (100%) |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | DUV Chamber (Hg) |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | 184.9nm (10%) |
| Spec2 | 253.7nm (90%) |
| Spec3 |
Unable to apply for
| Name | DUV Chamber (Hg) |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | 184.9nm (10%) |
| Spec2 | 253.7nm (90%) |
| Spec3 |
Unable to apply for
Vacuum process
| Name | Mask aligner UV exposure |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 4" |
| Spec2 | Contact, Non-contact, Vacuum mode |
| Spec3 |
| Name | Thermal Evaporator |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Metal Ag/Al/Au/Cr/Ni |
| Spec2 | Sample Size 4" |
| Spec3 |
| Name | RF-Sputter |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Materials Metals |
| Spec2 | Sample Size 4" |
| Spec3 |
| Name | ALD |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 5" |
| Spec2 | AlOx, ZnOx, and etc. |
| Spec3 |
| Name | RF-Magnetron Sputter |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 3" |
| Spec2 | ITO, IGZO, and etc. |
| Spec3 | Co-sputtering with 3 targets |
Unable to apply for
| Name | Reactive Ion Etcher |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 4"Ar, O2, CF4 gases, ~ 200 W |
| Spec2 | |
| Spec3 |
Unable to apply for
Solution process
| Name | Spin-Coater |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 4" |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Sonicator |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Wet Station |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Wet etching Al/Au/Cr |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Glove Box |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Metal & Organic, Nano-particles, QDs |
| Spec2 | Sample Size 4" |
| Spec3 | OLEDs, OPVs |
Unable to apply for
| Name | Glove Box |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Metal & Organic, Nano-particles, QDs |
| Spec2 | Sample Size 4" |
| Spec3 | OLEDs, OPVs |
Unable to apply for
Measurement & Analysis
| Name | Prove Station |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Vacuum Prove Station |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Polarized Optical Microscope |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 4" |
| Spec2 | Contact, Non-contact, Vacuum mode |
| Spec3 |
Unable to apply for
| Name | AFM |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Sample Size 4" Non-contact, Vacuum mode |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Ellipsometer |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | |
| Spec2 | |
| Spec3 |
Unable to apply for
Maintenance
| Name | DI water system |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | |
| Spec2 | |
| Spec3 |
Unable to apply for
| Name | Temperature & humidity Control System |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Temperature : 25° |
| Spec2 | Humidity : 30% |
| Spec3 |
Unable to apply for
| Name | N2 Generator |
|---|---|
| Model | |
| Manufacture | |
| Spec1 | Capacity : 15 N-m2/Hour |
| Spec2 | Purity : 99.99% |
| Spec3 | N2 pressure : 5 bar |
Unable to apply for
